氮化镓
2英寸氮化稼GaN厚膜衬底
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 MORSENSEMI 3英寸GaAs单晶片主要参数指标

产品型号Item

GaN-T-N

GaN-T-S

GaN-T-P

尺寸Dimensions

Ф 2”

厚度Thickness

4 µm, 10~40 µm

30 µm, 90 µm

5 µm

晶体取向Orientation

C-axis(0001) ± 1°

导电类型Conduction Type

N-type

Semi-Insulating

P-type

电阻率Resistivity(300K)

< 0.05 Ω·cm

﹥106 Ω·cm

< 0.05 Ω·cm

位错密度Dislocation Density

Less than 1x108 cm-2

衬底结构Substrate structure

Thick GaN on Sapphire(0001)

有效面积Useable Surface Area

> 90%

抛光Polishing

Standard: SSP

Option: DSP

包装Package

Packaged in a class 100 clean room environment, in cassettes of 25pcs or single wafer containers, under a nitrogen atmosphere.

 

 
 
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